Published since 1970, SPE's journal, Exposure, is exclusively devoted to the analysis and understanding of photography through scholarly insight, historical perspectives, critical dialogue, educational issues, and reviews of contemporary photographic publications. Exposure is published bi-annually in the Spring (March) and Fall (September).
CALL FOR ESSAYS, ART, PROJECTS
The Exposure journal is now accepting targeted submissions for the Fall 2017 issue on the theme of INFLUENCE. How do influences affect the work we make, the ideas we build upon, the way we teach our students how to think and how to make images? What constitutes productive influence? Is there such a thing as bad or dangerous influence in art making? What kinds of influences occur with artists and thinkers that work in photography that are outside the sphere of the genre? How does what is happening in photography meaningfully influence people working in disciplines seemingly removed from photography? How does influence build upon itself in a creative practice, or, conversely, how does it sometimes generate its opposite?
In the history of SPE and the Exposure journal, there was no larger influence than that of our founder, Nathan Lyons. The SPE family has mourned the passing of this legendary and most influential of figures, and the Fall 2017 issue of the journal will contain features that examine the scope and enduring legacy of his influence, especially as regards his work as an educator, curator and arts activist. If you have material or a proposal related to Nathan Lyons' work and life, please contact the editor.
The above represents just a small sample of possibilities on this theme. Essays, conversations, meditations, reviews and portfolios that examine the topic of Influence will all be considered for publication. Please DO NOT send submissions on subjects unrelated to the stated theme. Work submitted prior to March 1, 2017 will be given priority consideration for publication.
Submissions and proposals may be sent directly to the journal's editor Stacy Platt at: email@example.com
GUIDELINES FOR SUBMISSIONS
The Editor invites targeted submissions related to the stated theme for scholarly articles, interviews, conversations, art and cultural criticism, pedagogical essays, book and exhibition reviews, and any manuscripts that engage with the contemporary conversation on photography and related media.
For publication consideration, please submit
Submissions must include name, institutional affiliation, and contact information. Photographs, scans, and/or transparencies of all illustrations with caption information should be in hand at the time of submission. If your submission is considered for publication, the editor will contact you with further details regarding the delivery of a final manuscript. The author will need to supply all reproductions promptly at the request of the editor in time to meet publication deadlines. It is the author's responsibility to obtain permissions and to pay all reproduction fees.
Exposure has a long-standing commitment to highlight the work of innovative imagemakers and encourages submissions for lens-based projects from artists and photographers working in any field. Preference will be given to work that is related to the targeted call for the issue. The editor welcomes well-developed work from current students, educators and/or working artists. Submissions in the following formats/media are accepted via mail or email (please do not submit image files larger than 1MB each via email):
Imagemaker submissions should include:
Submissions must include your name, institutional affiliation (where applicable), and contact information. If your submission is considered for publication the editor will contact you with further details. The artist will need to supply publication-quality reproductions promptly at the request of the editor in time to meet publication deadlines.
If sending your submission by mail, please include a self-addressed, stamped envelope for return of materials. Otherwise, we will dispose of/recycle all materials received.
Please submit materials to:
Stacy J. Platt, Editor, Exposure
Society for Photographic Education
2530 Superior Ave., #403
Cleveland, OH 44114