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Critical Distance

Deadline: 07/15/22

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Experts say it takes twenty years to lend honest reflection on major life and global events; taking critical distance to look back at what holds new relevance now. Over the past few years the effects of multiple pandemics have become glaring. Inequities have been overlooked, consciously and out of convenience, but over time they become unavoidable. These events are not contained within our national borders. The current pandemic is a reminder that health is interconnected. The political consequences of the past 20 years echoes across the globe and we recognize the need to evaluate the insights of photographers outside of the US and Western Europe.Simply put, photographers make visual records of these circumstances. The significance of these images may not be fully recognized until a critical distance has passed. This exhibition will facilitate an opportunity for critical distance, from then & now during the FotoFocus 2022 Biennial, World Record.
Critical Distance is an international juried exhibition that is apart of the FotoFocus 2022 Biennial, World Record. This exhibition will open in October 2022 at 400 W Rich Street in Columbus, OH, USA.

We are honored to have and excited to share that Adama Delphine Fawundu as the Critical Distance Juror.

Adama Delphine Fawundu is a photographer and visual artist born in Brooklyn, NY. Fawundu co-published the critically acclaimed book, MFON: Women Photographers of the African Diaspora. She is a 2022 Outwin Boochever Portrait Competition finalist. Her awards also include, the Anonymous Was A Woman Award, New York Foundation for The Arts Photography Fellowship (2016) and the Rema Hort Mann Artist Grant (2018) amongst others. She was commissioned by the Park Avenue Armory to participate in the 100 Years|100 Women Project/The Women's Suffrage NYC Centennial Consortium (2019-2021). Her works are in the permanent collections of the Brooklyn Museum of Art, Brooklyn, NY; Princeton University Museum, Princeton, NJ; Bryn Mawr College, Bryn Mawr, PA; The Petrucci Family Foundation of African American Art, Asbury, NJ; The Brooklyn Historical Society, Brooklyn, NY; Norton Museum of Art, Palm Springs, FL; The David C. Driskell Art Collection, College Park, MD; and number of private collections. She is an Assistant Professor of Visual Arts at Columbia University.

Submission Instructions:
1. visit and click on the Critical Distance Exhibition button to donate $10 to SPE

2. take a screen shot of this payment receipt and include in your submission materials.

3. submit required materials: up to 5 images in the correct format, image list (including: title, medium, size, price), artist statement (500 words max), and receipt of payment.

Files must be labeled as First InitialLast Name_image #.jpg (example: JRenner_01.jpg), First InitialLast Name_image list.pdf, First InitialLast Name_statement.pdf, etc.

Images must not exceed 3MB, 3,000 pixels on the longest dimension.
Save as Adobe RGB.
Please note: Improperly titled jpegs and/or missing information will result in your submission not being reviewed by the jury.

3. send all appropriately sized and labeled files to via
You will receive an email confirmation once the submission is successfully downloaded.




Must be a member of SPE by the time of exhibition/acceptance of; but you do not need to be a current member to apply.
Make photographic, light-based art.
Explore themes that fit into the realm of "critical distance".
Works submitted must be made within the last twenty years- 2002 and 2022


Each artist is limited to 5 pieces of photographic art, professionally presented, and ready to
be displayed. **must become a member of SPE if invited to participate in the exhibition**

Evaluation Criteria

Eligible Work:
From traditional to digital to alternative processes to video, all photographic techniques and approaches are welcome. Fine Art photography, documentary, commercial, mixed media incorporating photography, photo books & sculptures, and digital imaging and collages – are all eligible for consideration by the jury, but must fit the dialogue of the exhibition theme.
Installation type work should be tested prior to submission, and easy to install.


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